Joint ESS-MAX IV Science Colloqium

What’s inside? Atomic layer deposition studied in real time

by Prof. Joachim Schnadt (Lund University)

Europe/Stockholm
Zoom

Zoom

https://ess-eu.zoom.us/j/62131396564?pwd=UEZHNlI3aFRLNDNxZFQ2a2xwck82UT09
Description

Atomic layer deposition is a method for growing ultrathin films of material in a highly controlled fashion. The technique has tremendous significance in semiconductor technology used to produce the digital devices that we all use on a daily basis. Moreover, its importance in the manufacturing of a wide range of materials such as for batteries, catalysts, solar cells and many others is growing rapidly. At the same time, our understanding of the chemical processes behind atomic layer deposition is extremely limited – essentially, we don’t know properly how it works. In the presentation I’ll outline how synchrotron based in situ x-ray experiments can provide us a direct glimpse into the chemistry of atomic layer deposition.

 

Zoom: https://ess-eu.zoom.us/j/62131396564?pwd=UEZHNlI3aFRLNDNxZFQ2a2xwck82UT09